The Journal of Technological and Space Plasmas (JTSP) is an online full open access journal that publishes novel research with high significance across a broad readership in science and industry. The journal is owned and run by Gruenwald Laboratories.

The selection of content and the peer review process is managed by a board of internationally renowned scientists. Published papers will not only be promoted throughout the scientific community but also in the industrial network of G-Labs.

Owned by Gruenwald LaboratoriesThe Journal of Technological and Space Plasmas (JTSP) is an open-access, electronic-only journal publishing original research in the field of plasma physics. The journal's Editorial Board and staff are committed to publish articles of outstanding scientific quality that attract the attention and interest of the scientific as well as the industrial community. JTSP is available free to all its readers and is funded by article publication charges.

Subject Coverage

JTSP’s coverage is focussed but not limited to the following fields of plasma physics, encompassing pure, applied, theoretical and experimental research, as well as interdisciplinary topics:

  • Technologically relevant plasmas (e.g. PECVD, welding, etc.)
  • Plasma medicine
  • Fusion Science and Technology
  • Plasmas for Space Applications
  • Space Plasmas (i.e. Physics of the magnetosphere, physics of stars, etc.)

Article Requirements

A JTSP article must be written according to the highest scientific quality standards, both in terms of originality and significance. The results have to make substantial advances within the field of plasma physics. The impact of a JTSP article should be appealing to the journal's broad readership in science and industry. To ensure the high standards of JTSP, every submitted article is preliminarily assessed by the Editorial Board before sending it to independent referees.

Article Style

JTSP publishes only original research, which has not been submitted to other journals or is currently under review somewhere else. As a journal read by the whole plasma science community, article abstracts, introductions and conclusions should also mention wider implications of the work within plasma science and technology. However, the main body of each manuscript should not compromise on the scientific rigour that is demanded by an international research journal. The broad readership of JTSP gives authors an opportunity to reach a wider audience, as well as specialists from science and industry.

Article Length

In general, submitted articles should not be longer than 18,000 words (an average of 900 words per A4 size journal page). For review articles the maximum word count is 27,000 words.

Citing an article in JTSP

JTSP uses an article numbering system, starting with [1] in the pdf document, allowing articles to be published one at a time. Articles should be referenced by using the official abbreviation of the journal, for instance:

[1] J. Gruenwald, A. Einstein, and J. Doe, “A guide for writing for the JTSP,” J. of Technol. and Space Plasmas, vol. 0, no. 1, 2018.


If studies of humans or animals are involved in a paper, the authors must pay due attention to the ethical aspects of the study. Such works must be in compliance with local statutory requirements. The Journal of Technological and Space Plasmas endorses fully the World Medical Association Declaration of Helsinki on Ethical Principles for Medical Research Involving Human Subjects, the latest version of which may be found at A statement should be made that the study has been carried out with ethical committee approval, where this is necessary. Studies involving experiments on animals must attend to the welfare of the animals. The guidelines of the United Kingdom Coordinating Committee on Cancer Research (UKCCCR) provide a basis for welfare considerations. Authors must also be aware of Guide for the Care and Use of Laboratory Animals by the Institute of Laboratory Animal Resources, which may be found at Please state if the work has been subject to animal ethics committee approval.

ISSN: 2616-647X